Z. (. Kong Et Al. , "Process Performance Prediction for Chemical Mechanical Planarization (CMP) by Integration of Nonlinear Bayesian Analysis and Statistical Modeling," IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.23, no.2, pp.316-327, 2010
Kong, Z. (. Et Al. 2010. Process Performance Prediction for Chemical Mechanical Planarization (CMP) by Integration of Nonlinear Bayesian Analysis and Statistical Modeling. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.23, no.2 , 316-327.
Kong, Z. (., OZTEKIN, A., Beyca, O. F., PHATAK, U., BUKKAPATNAM, S. T. S., & KOMANDURI, R., (2010). Process Performance Prediction for Chemical Mechanical Planarization (CMP) by Integration of Nonlinear Bayesian Analysis and Statistical Modeling. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.23, no.2, 316-327.
Kong, Zhenyu Et Al. "Process Performance Prediction for Chemical Mechanical Planarization (CMP) by Integration of Nonlinear Bayesian Analysis and Statistical Modeling," IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.23, no.2, 316-327, 2010
Kong, Zhenyu (. Et Al. "Process Performance Prediction for Chemical Mechanical Planarization (CMP) by Integration of Nonlinear Bayesian Analysis and Statistical Modeling." IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.23, no.2, pp.316-327, 2010
Kong, Z. (. Et Al. (2010) . "Process Performance Prediction for Chemical Mechanical Planarization (CMP) by Integration of Nonlinear Bayesian Analysis and Statistical Modeling." IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.23, no.2, pp.316-327.
@article{article, author={Zhenyu (James) Kong Et Al. }, title={Process Performance Prediction for Chemical Mechanical Planarization (CMP) by Integration of Nonlinear Bayesian Analysis and Statistical Modeling}, journal={IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING}, year=2010, pages={316-327} }