A. Yoshio Et Al. , "Effect of O2 flow concentration during reactive sputtering of Ni oxide thin films on their electrochemical and electrochromic properties in aqueous acidic and basic electrolyte solutions," JAPANESE JOURNAL OF APPLIED PHYSICS , vol.45, pp.7780-0, 2006
Yoshio, A. Et Al. 2006. Effect of O2 flow concentration during reactive sputtering of Ni oxide thin films on their electrochemical and electrochromic properties in aqueous acidic and basic electrolyte solutions. JAPANESE JOURNAL OF APPLIED PHYSICS , vol.45 , 7780-0.
Yoshio, A., SeHee, L., Özkan Zayim, E., C Edwin, T., Roland, P., & Satyen K, D., (2006). Effect of O2 flow concentration during reactive sputtering of Ni oxide thin films on their electrochemical and electrochromic properties in aqueous acidic and basic electrolyte solutions. JAPANESE JOURNAL OF APPLIED PHYSICS , vol.45, 7780-0.
Yoshio, Abe Et Al. "Effect of O2 flow concentration during reactive sputtering of Ni oxide thin films on their electrochemical and electrochromic properties in aqueous acidic and basic electrolyte solutions," JAPANESE JOURNAL OF APPLIED PHYSICS , vol.45, 7780-0, 2006
Yoshio, Abe Et Al. "Effect of O2 flow concentration during reactive sputtering of Ni oxide thin films on their electrochemical and electrochromic properties in aqueous acidic and basic electrolyte solutions." JAPANESE JOURNAL OF APPLIED PHYSICS , vol.45, pp.7780-0, 2006
Yoshio, A. Et Al. (2006) . "Effect of O2 flow concentration during reactive sputtering of Ni oxide thin films on their electrochemical and electrochromic properties in aqueous acidic and basic electrolyte solutions." JAPANESE JOURNAL OF APPLIED PHYSICS , vol.45, pp.7780-0.
@article{article, author={Abe Yoshio Et Al. }, title={Effect of O2 flow concentration during reactive sputtering of Ni oxide thin films on their electrochemical and electrochromic properties in aqueous acidic and basic electrolyte solutions}, journal={JAPANESE JOURNAL OF APPLIED PHYSICS}, year=2006, pages={7780-0} }