Z. Kong Et Al. , "Nonlinear Sequential Bayesian Analysis-Based Decision Making for End-Point Detection of Chemical Mechanical Planarization (CMP) Processes," IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.24, no.4, pp.523-532, 2011
Kong, Z. Et Al. 2011. Nonlinear Sequential Bayesian Analysis-Based Decision Making for End-Point Detection of Chemical Mechanical Planarization (CMP) Processes. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.24, no.4 , 523-532.
Kong, Z., Beyca, O., BUKKAPATNAM, S. T., & KOMANDURI, R., (2011). Nonlinear Sequential Bayesian Analysis-Based Decision Making for End-Point Detection of Chemical Mechanical Planarization (CMP) Processes. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.24, no.4, 523-532.
Kong, Zhenyu Et Al. "Nonlinear Sequential Bayesian Analysis-Based Decision Making for End-Point Detection of Chemical Mechanical Planarization (CMP) Processes," IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.24, no.4, 523-532, 2011
Kong, Zhenyu Et Al. "Nonlinear Sequential Bayesian Analysis-Based Decision Making for End-Point Detection of Chemical Mechanical Planarization (CMP) Processes." IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.24, no.4, pp.523-532, 2011
Kong, Z. Et Al. (2011) . "Nonlinear Sequential Bayesian Analysis-Based Decision Making for End-Point Detection of Chemical Mechanical Planarization (CMP) Processes." IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING , vol.24, no.4, pp.523-532.
@article{article, author={Zhenyu Kong Et Al. }, title={Nonlinear Sequential Bayesian Analysis-Based Decision Making for End-Point Detection of Chemical Mechanical Planarization (CMP) Processes}, journal={IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING}, year=2011, pages={523-532} }