I. WU Et Al. , "RETARDATION OF NUCLEATION RATE FOR GRAIN-SIZE ENHANCEMENT BY DEEP SILICON ION-IMPLANTATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON FILMS," JOURNAL OF APPLIED PHYSICS , vol.65, no.10, pp.4036-4039, 1989
WU, I. Et Al. 1989. RETARDATION OF NUCLEATION RATE FOR GRAIN-SIZE ENHANCEMENT BY DEEP SILICON ION-IMPLANTATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON FILMS. JOURNAL OF APPLIED PHYSICS , vol.65, no.10 , 4036-4039.
WU, I., CHIANG, A., FUSE, M., OVECOGLU, L., & HUANG, T., (1989). RETARDATION OF NUCLEATION RATE FOR GRAIN-SIZE ENHANCEMENT BY DEEP SILICON ION-IMPLANTATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON FILMS. JOURNAL OF APPLIED PHYSICS , vol.65, no.10, 4036-4039.
WU, IW Et Al. "RETARDATION OF NUCLEATION RATE FOR GRAIN-SIZE ENHANCEMENT BY DEEP SILICON ION-IMPLANTATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON FILMS," JOURNAL OF APPLIED PHYSICS , vol.65, no.10, 4036-4039, 1989
WU, IW Et Al. "RETARDATION OF NUCLEATION RATE FOR GRAIN-SIZE ENHANCEMENT BY DEEP SILICON ION-IMPLANTATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON FILMS." JOURNAL OF APPLIED PHYSICS , vol.65, no.10, pp.4036-4039, 1989
WU, I. Et Al. (1989) . "RETARDATION OF NUCLEATION RATE FOR GRAIN-SIZE ENHANCEMENT BY DEEP SILICON ION-IMPLANTATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON FILMS." JOURNAL OF APPLIED PHYSICS , vol.65, no.10, pp.4036-4039.
@article{article, author={IW WU Et Al. }, title={RETARDATION OF NUCLEATION RATE FOR GRAIN-SIZE ENHANCEMENT BY DEEP SILICON ION-IMPLANTATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON FILMS}, journal={JOURNAL OF APPLIED PHYSICS}, year=1989, pages={4036-4039} }