Atıf İçin Kopyala
POLAT B. D., Keleş Ö.
ELECTROCHIMICA ACTA, cilt.170, ss.63-71, 2015 (SCI-Expanded)
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Yayın Türü:
Makale / Tam Makale
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Cilt numarası:
170
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Basım Tarihi:
2015
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Doi Numarası:
10.1016/j.electacta.2015.04.131
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Dergi Adı:
ELECTROCHIMICA ACTA
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Derginin Tarandığı İndeksler:
Science Citation Index Expanded (SCI-EXPANDED), Scopus
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Sayfa Sayıları:
ss.63-71
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Anahtar Kelimeler:
Copper-Silicon film, electrochemical impedance analysis, magnetron sputtering, lithium ion batteries, anode, SOLID-STATE AMORPHIZATION, INSERTION/EXTRACTION REACTION, ELECTROCHEMICAL IMPEDANCE, CARBON-FIBER, ELECTRODE, GRAPHITE
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İstanbul Teknik Üniversitesi Adresli:
Evet
Özet
In this work, we deposit a bare and a Cu capped CuSi films (that contains 10% at. Cu 3 mu m thicknesses) by magnetron sputtering. The samples are galvanostatically tested with C/12 rate: the Cu capped CuSi film delivers 850 mAhg(-1) after 30th cycles, and it retains stable up to 100 cycle with 99% coulombic efficiency, whilst the bare CuSi film performs a gradual decrease in capacity over 100 cycles.