Determination of ion dose and profiles in Ge-74 and Sn-120 implanted silicon layers by PIXE, NAA, RBS and SIMS


Belin B., Bode P., Turan R., Van Meerten T.

JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY, cilt.261, ss.479-483, 2004 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 261 Konu: 2
  • Basım Tarihi: 2004
  • Doi Numarası: 10.1023/b:jrnc.0000034889.71332.26
  • Dergi Adı: JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY
  • Sayfa Sayıları: ss.479-483

Özet

Implanted Ge-74 and Sn-121 concentrations in silicon (Si) layers were investigated by particle induced X-ray emission (PIXE), instrumental neutron activation analysis (INAA), Rutherford backscattering spectrometry (RBS) and secondary ion mass spectrometry (SIMS). Slight differences were observed in the results obtained. It was shown that PIXE and INAA are as powerful as the traditional RBS and SIMS spectroscopy for the investigation of thin layered Si.