Structure and Properties of Ti-Al-Y-N Coatings Deposited from Filtered Cathodic-arc Plasma in Gas Ar and N-2 Mixture

Vasyliev V., Luchaninov A., Reshetniak E., Strel'nitskij V., Azar G. T. P. , Urgen M. K.

7th IEEE International Conference Nanomaterials - Application and Properties (NAP), Odessa, Ukraine, 10 - 15 September 2017 identifier

  • Publication Type: Conference Paper / Full Text
  • Volume:
  • City: Odessa
  • Country: Ukraine
  • Istanbul Technical University Affiliated: Yes


The results of studies of the structure and stress state of Ti-Al-Y-N coatings deposited by the PIII & D method from a filtered vacuum arc plasma under conditions of supplying a pulsed substrate bias potential at an amplitude of 1.5 kV are presented. X-ray diffraction analysis was used to study the influence of argon additives in the range of 0 to 30% to nitrogen on the characteristics of coatings. It is established that, regardless of the argon concentration in the gas mixture, the coatings have nearly close elemental composition and a nanocrystalline structure of the cubic solid solution (Ti, Al)N (structural type NaCl) with a biaxial texture [110] and [100]. As the argon content increases, the columnar microstructure and the size of the nitride crystallites in the coatings are retained, the level of compressive stresses changes nonmonotonically in the range of 6-8 GPa, and the hardness of the coatings remains at a high level of 32-34 GPa.