Dynamical analysis of sputtering at threshold energy range: Modelling of Ar+Ni(100) collision system


Hundur Y. , Guvenc Z. B. , HIPPLER R.

CHINESE PHYSICS LETTERS, vol.25, no.2, pp.730-733, 2008 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 25 Issue: 2
  • Publication Date: 2008
  • Doi Number: 10.1088/0256-307x/25/2/102
  • Title of Journal : CHINESE PHYSICS LETTERS
  • Page Numbers: pp.730-733

Abstract

The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental data.