SYNTHESIS AND CHARACTERIZATION OF BORON CARBIDE THIN FILMS GROWN BY RF SPUTTERING


Tavsanoglu T., Labdi S., Jeandin M.

138th TMS Annual Meeting and Exhibition, San-Francisco, Kostarika, 15 - 19 Şubat 2009, ss.573-574 identifier

  • Basıldığı Şehir: San-Francisco
  • Basıldığı Ülke: Kostarika
  • Sayfa Sayıları: ss.573-574

Özet

Boron carbide thin films of 500-700 nm were deposited by RF sputtering of a boron carbide target. Non-columnar morphology of the films was observed by cross-sectional scanning electron microscope investigations. Electron probe microanalyses showed that the composition of the films was independent of the process parameters. Secondary ion mass spectrometer measurements demonstrated that the elemental film composition was constant over the whole depth of the film. Hardness and Young's modulus of the films were found 22 GPa and 240 GPa respectively from AFM coupled nanoindentation measurements. FTIR analyses were conducted to evaluate bonding characteristics of boron carbide. X-ray diffraction results indicated that the films were amorphous. Tribological properties of the films were also investigated by pin-on-disc test measurements.