Deposition of Diamond onto a Titanium Substrate using a Molybdenum Intermediate Layer


Ali M., Urgen M. K. , QAZI I. A.

CHEMICAL VAPOR DEPOSITION, cilt.19, ss.284-289, 2013 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 19
  • Basım Tarihi: 2013
  • Doi Numarası: 10.1002/cvde.201307063
  • Dergi Adı: CHEMICAL VAPOR DEPOSITION
  • Sayfa Sayıları: ss.284-289

Özet

Realizing that certain industrial applications may require diamond films to be deposited over a surface that has the hardness of titanium but has a much higher melting point, the deposition of diamond films over titanium with a pre-deposited thin film of molybdenum is investigated for the first time. Scanning electron microscopy (SEM) observations show that diamond films synthesized over silicon and metallic substrates exhibit identical morphologies. Raman spectra show that films deposited over a metallic substrate exhibit much higher stress than that of films deposited over silicon. X-ray diffraction (XRD) patterns reveal that carbon and metallic elements diffuse at or near the interface but do not affect the final texture of film.