Structure and Properties of TiN Coatings Deposited by Filtered Vacuum-arc Plasma in the Gas Mixture N-2 with Ar


Vasyliev V. V. , Luchaninov A. A. , Reshetnyak E. N. , Strel'nitskij V. E. , Urgen M. K.

6th International Conference on Nanomaterials - Applications & Properties (NAP), Lviv, Ukraine, 14 - 19 September 2016 identifier

  • Publication Type: Conference Paper / Full Text
  • Volume:
  • City: Lviv
  • Country: Ukraine

Abstract

Results of the study of structure, state of stress and hardness of TiN coatings deposited with PIII&D by using rectilinear filtered vacuum arc plasma system are present. Study the effect of argon addition into the nitrogen environment in the range from 0 to 45 % on characteristics of coatings deposited with application of a high pulse bias potential with amplitude of 1 kV have been performed. It was found that the coatings have a structure of TiN (structural type NaCl) with the [110] axial texture regardless of the concentration of argon in the gas mixture. With increasing the content of argon the level of residual stress is increased from 7 GPa to 10 GPa, the grain size in the coatings is reduced from 8-9 nm to 7 nm, and the coating hard-ness remains at a high level 27-32 GPa.