Damage to sub half micron metal oxide silicon field effect transistor from plasma processing of low k polymer interlayer dielectrics | AVESİS

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Damage to sub half micron metal oxide silicon field effect transistor from plasma processing of low k polymer interlayer dielectrics

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Trabzon L., Awadelkarim O.

SEMICONDUCTOR SCIENCE AND TECHNOLOGY, vol.0, 2000 (SCI-Expanded)

Publication Type: Article / Article
Volume: 0
Publication Date: 2000
Journal Name: SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
Istanbul Technical University Affiliated: Yes