The evolution of microstructure strain partitioning during quasi in situ tensile loading of grade 2205 duplex stainless steel has been investigated. Digital image correlation revealed the development of tensile strain initially in austenite and at interphase boundaries, and further extending into the ferrite with increasing load. Higher resolution digital image correlation observations indicated strain hardening of austenite, followed by deformation of the ferrite. Digital image correlation analysis of a 20% cold-rolled microstructure revealed tensile strain development at interphases, with discrete tensile and compressive strain pockets observed within the austenite. X-ray diffraction measurements indicated the presence of tensile stresses primarily developing in the ferrite, with full-width at half maximum values indicating plastic strain accumulation primarily in the austenite. The effect of tensile loading on Volta potential differences, obtained via scanning Kelvin probe force microscopy, highlighted the development of discrete anodic and cathodic sites with the introduction of strain. A Volta potential roughness parameter (Psi(Ra)) is introduced describing Volta potential changes as a function of strain. This observation supports the concept of an enhanced propensity of local electrochemical activity with increasing applied strain in duplex stainless steel.