RESIDUAL ABERRATION CORRECTIONS IN FAR FIELD IN-LINE HOLOGRAPHY USING AN AUXILIARY OFF-AXIS HOLOGRAM

OZKUL C., ANTHORE N.

APPLIED OPTICS, vol.30, no.4, pp.372-373, 1991 (SCI-Expanded) identifier

  • Publication Type: Article / Article
  • Volume: 30 Issue: 4
  • Publication Date: 1991
  • Journal Name: APPLIED OPTICS
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Aerospace Database, Applied Science & Technology Source, Aquatic Science & Fisheries Abstracts (ASFA), Communication Abstracts, Compendex, EMBASE, MEDLINE, DIALNET
  • Page Numbers: pp.372-373
  • Istanbul Technical University Affiliated: No

Abstract

To obtain a diffraction-limited resolution with a lens assisted Fraunhofer hologram reconstructed by a reverse reference beam, residual aberrations have been corrected by using an auxiliary off-axis hologram.