RESIDUAL ABERRATION CORRECTIONS IN FAR FIELD IN-LINE HOLOGRAPHY USING AN AUXILIARY OFF-AXIS HOLOGRAM


OZKUL C. , ANTHORE N.

APPLIED OPTICS, vol.30, no.4, pp.372-373, 1991 (Journal Indexed in SCI) identifier

  • Publication Type: Article / Article
  • Volume: 30 Issue: 4
  • Publication Date: 1991
  • Title of Journal : APPLIED OPTICS
  • Page Numbers: pp.372-373

Abstract

To obtain a diffraction-limited resolution with a lens assisted Fraunhofer hologram reconstructed by a reverse reference beam, residual aberrations have been corrected by using an auxiliary off-axis hologram.