Use of N,N-dimethylaniline end-functional polymers in photoinduced block copolymerization


MUFTUOGLU A., Cianga I., YURTERI S., Yagci Y.

JOURNAL OF APPLIED POLYMER SCIENCE, vol.93, no.1, pp.387-394, 2004 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 93 Issue: 1
  • Publication Date: 2004
  • Doi Number: 10.1002/app.20468
  • Title of Journal : JOURNAL OF APPLIED POLYMER SCIENCE
  • Page Numbers: pp.387-394

Abstract

N,N-Dimethylaniline functional polystyrenes with well-defined structures and low polydispersities were synthesized by atom transfer radical polymerization of styrene in bulk at 110degreesC using 4-(dimethylamino)benzyl 4-(bromomethyl) benzoate as initiator in conjunction with a cuprous complex [Cu(I)Br/bipyridine]. These polymers were further used in block copolymerization with methyl methacrylate and cyclohexene oxide (CHO) by photoinduced radical and radical-promoted cationic polymerization routes, respectively. In the former case, macroradical generation was achieved with benzophenone sensitizer by photoexcitation followed by hydrogen abstraction from amino end groups. A visible light initiating system was used in the radical-promoted cationic polymerization of CHO. The system involves a xanthene dye (erythrosin B) as the sensitizer, an aromatic N,N-dimethyl amino group and diphenyl iodonium hexafluorophosphate as the radical source and radical oxidizer, respectively. Whereas pure block copolymers were obtained in the free-radical route, the free-radical-promoted cationic polymerization yielded both block and homopolymers. (C) 2004 Wiley Periodicals, Inc.