CHARACTERIZATION OF A PT+PD ALLOY ELECTRODE BY UNDERPOTENTIAL DEPOSITION OF COPPER


FICICIOGLU F., KADIRGAN F.

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, vol.346, pp.187-196, 1993 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 346
  • Publication Date: 1993
  • Doi Number: 10.1016/0022-0728(93)85012-6
  • Title of Journal : JOURNAL OF ELECTROANALYTICAL CHEMISTRY
  • Page Numbers: pp.187-196

Abstract

The surface characterization of a Pt+Pd alloy electrode using copper deposited at underpotentials is described. The alloy was prepared by codeposition under the same conditions at all times. The surface of the Pt+Pd alloy (20at.% Pd) electrode was pretreated by simple flame annealing. The behaviour of the underpotentially deposited copper was studied as a function of time, deposition potential and CuSO4 concentration. The true surface areas, calculated from surface estimations based on the oxygen and copper monolayers, are compared.