Simple Photochemical Route to Block Copolymers via Two-Step Sequential Type II Photoinitiation


Aykac F. S. , Yagci Y.

MACROMOLECULAR CHEMISTRY AND PHYSICS, vol.219, no.7, 2018 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 219 Issue: 7
  • Publication Date: 2018
  • Doi Number: 10.1002/macp.201700589
  • Title of Journal : MACROMOLECULAR CHEMISTRY AND PHYSICS

Abstract

A simple method for the preparation of block copolymers by a two-step sequential Type II photoinitiation is described. In the first step, amine functionalized poly(methyl methacrylate) (PMMA-N(Et)(2)) is prepared by photopolymerization of methyl methacrylate at = 350 nm using benzophenone and triethyl amine as photosensitizer and hydrogen donor, respectively. Subsequent benzophenone-sensitized photopolymerization of tert-butyl acrylate using PMMA-N(Et)(2) as hydrogen donor yielded poly(methyl methacrylate)-block-poly(tert-butyl acrylate). The obtained hydrophobic block copolymer is readily converted to amphiphilic polymer by hydrolysis of the tert-butyl ester moieties of the block copolymer as demonstrated by contact angle measurements. All polymers are characterized by NMR, Fourier transform infrared and UV-vis spectroscopies, and differential scanning calorimetry (DSC) thermal analyses.