JOURNAL OF ALLOYS AND COMPOUNDS, vol.823, 2020 (SCI-Expanded)
The present work reports for the first time in the open literature the formation of 4-mu m thick film with alternate layers of nickel and silicon by the magnetron sputtering method. Of the two kinds of samples prepared, the first is composed of alternate nanometer thick (<15 nm) Ni rich and Si rich layers. Employing a novel conceptual design to further improve the film's mechanical properties, a second sample is produced in which additional Ni rich layers (60 nm thick) are deposited over each micron thick of Ni/Si bilayers.