Sputtering yield and dynamical analysis of Ni(100) surface: A comparison of four different Ar-surface interaction potentials


Guvenc Z., Hundur Y., HIPPLER R.

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, vol.164, pp.854-860, 2000 (SCI-Expanded) identifier identifier

Abstract

The sputtering process of the Ar + Ni(100) collision system is investigated by means of constant energy molecular dynamics simulations. The Ni(100) is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using four different screened Coulomb type potentials. The Ni atom emission from the lattice is analysed over the range of 10-40 eV collision energy.