Modification Pathways for Copoly(2-oxazoline)s Enabling Their Application as Antireflective Coatings in Photolithography


Fimberger M., BEHRENDT A., JAKOPIC G., STELZER F., Kumbaraci V. , WIESBROCK F.

MACROMOLECULAR RAPID COMMUNICATIONS, vol.37, no.3, pp.233-238, 2016 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 37 Issue: 3
  • Publication Date: 2016
  • Doi Number: 10.1002/marc.201500589
  • Title of Journal : MACROMOLECULAR RAPID COMMUNICATIONS
  • Page Numbers: pp.233-238

Abstract

Chromophore-functionalized copoly(2-oxazoline)s are successfully evaluated as bottom antireflective coatings (BARCs) in high-resolution photolithography. With respect to UV light sources used in photolithographic production routines, anthracene is chosen as a chromophore. For application as polymer in BARCs, the copolymer poly(2-ethyl-2-oxazolin)(45)-stat-poly(2-dec-9-enyl-2-oxazolin)(20)-stat-poly(2-(3-(1-(anthracen-9-ylmethyl)-1,2,3-triazol-4-yl)propyl)-2-oxazolin)(35) can be synthesized by the Huisgen cycloaddition click reaction of the copolymer poly(2-ethyl-2-oxazolin)(45)-stat-poly(2-dec-9-enyl-2-oxazolin)(20)-stat-poly(2-pent-4-inyl-2-oxazolin)(35) and the corresponding azide-functionalized anthracenes. These copolymers can be crosslinked by the thermally induced thiol-ene reaction involving the unsaturated C=C bonds of the poly(2-dec-9-enyl-2-oxazoline) repetition units and a multifunctional thiol as crosslinker. Tests of this BARC in a clean room under production conditions reveal a significant decrease of the swing-curve of a chemically amplified positive photoresist by more than 50%, hence significantly increasing the resolution of the photoresist.